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Idealized solubility diagram for film forming species in water. Adapted from B. C. Bunker, P. C. Rieke, B. J. Tarasevich, A. A. Campbell, G. E. Fryxall, G. L. Graff, L. Song, J. Liu, J. W. Virden, and G. L. McVay, Science , 1994, 264 , 48.

Silica can be dissolved in fluorosilicic acid to well above its solubility in water, which is approximately 220 ppm (mg/L). Depending on the concentration of the fluorosilicic acid solution, it can contain up to 20% more silica than is implied by the formula H 2 SiF 6 . After saturation of the solution with SiO 2 , the solvated species is a mixture of fluorosilicates, which reacts as explained earlier. It must be emphasized that addition of water in this reaction is not simply dilution, but is the addition of a reactant, which places the solution in a metastable state (the blue area in [link] ) in preparation for the introduction of a suitable surface to seed the growth of silica.

Another important factor in solution growth methods is interfacial energy. When a substrate with lower interfacial energy than that of a growing homogeneous nucleus is introduced into a growth solution, heterogeneous growth is favored. Thus, a seeded growth mechanism by definition introduces a substrate of lower interfacial energy into a supersaturated solution, facilitating heterogeneous growth. Lower interfacial energies can be a product of surface modification, as well as a property of the materials’ natural state.

Comparing lpd to sol-gel

An alternative method to LPD for forming silica thin films is the sol-gel method. A sol is a colloidal dispersion of particles in a liquid. A gel is a material that contains a continuous solid matrix enclosing a continuous liquid phase. The liquid inhibits the solid from collapsing and the solid impedes release of the liquid. A formal definition of sol-gel processing is the “growth of colloidal particles and their linking together to form a gel.” This method describes both the hydrolysis and condensation of silicon alkoxides and the hydrolysis and condensation of aqueous silicates (the DS process).

In the hydrolysis of silicon alkoxides, an alkoxide group is replaced with a hydroxyl group, [link] . Further condensation reactions between alkoxyl groups or hydroxyl groups produce siloxane bonds, see [link] and [link] .

Tetramethoxysilane [Si(OMe) 4 , TMOS] and tetraethylorthoxysilane [Si(OEt) 4 , TEOS] are the most commonly used precursors in silica sol-gel processing. The alkoxides are hydrolyzed in their parent alcohols, with a mineral acid or base catalyst, producing silicate gels that can be deposited as coatings. The Stober method, which utilizes this chemistry, relies on homogeneous nucleation to produce monodisperse sols.

Iler’s DS method of silica film formation was originally patented as a pigment coating to increase dispersibility of titania particles for use in the paint industry. The DS method is based on the aqueous chemistry of silica and takes advantage of the species present in solution at varying pH. Below pH 7 three-dimensional gel networks are formed. Above pH 7 silica surfaces are quite negatively charged ( [link] ), so that particle growth occurs without aggregation. The isoelectric point of silica is pH 2. Reactions above and below pH 2 are thought to occur through bimolecular nucleophilic condensation mechanisms. Above pH 2 an anionic species attacks a neutral species ( [link] ) and below pH 2 condensation involves a protonated silanol ( [link] ). The DS process has been utilized extensively in sol-gel coating technology and as a growth method for monodisperse and polydisperse sols.


  • B. C. Bunker, P. C. Rieke, B. J. Tarasevich, A. A. Campbell, G. E. Fryxall, G. L. Graff, L. Song, J. Liu, J. W. Virden, and G. L. McVay, Science , 1994, 264 , 48.
  • P.-H. Chang, C.-T. Huang, and J.-S. Shie, J. Electrochem. Soc. , 1997, 144 , 1144.
  • J.-S. Chou and S.-C. Lee, J. Electrochem. Soc. , 1994, 141 , 3214.
  • T. Homma, T. Katoh, Y. Yamada, and Y. Murao, J. Electrochem. Soc. , 1993, 140 , 2410.
  • R. K. Iler, The Chemistry of Silica Solubility, Polymerization, Colloid and Surface Properties, and Biochemistry , John Wiley&Sons (1979).
  • H. R. Jafry, E. A. Whitsitt, and A. R. Barron, J. Mater. Sci ., 2007, 42 , 7381.
  • T. Niesen and M. R. De Guire, J. Electroceramics , 2001, 6 , 169.
  • N. Ozawa, Y. Kumazawa, and T. Yao, Thin Solid Films , 2002, 418 , 102.
  • W. Stober, A. Fink, and E. Bohn, J. Colloid Interface Sci. , 1968, 26 , 62.
  • D. Whitehouse, Glass of the Roman Empire , Corning (1988).
  • E. A. Whitsitt and A. R. Barron, Nano Lett ., 2003, 3 , 775.
  • E. A. Whitsitt and A. R. Barron, Chem. Commun ., 2003, 1042.
  • E. A. Whitsitt and A. R. Barron, J. Colloid Interface Sci ., 2005, 287 , 318.
  • C.-F. Yeh, C.-L. Chen, and G.-H. Lin, J. Electrochem. Soc. , 1994, 141 , 3177.

Questions & Answers

can someone help me with some logarithmic and exponential equations.
Jeffrey Reply
sure. what is your question?
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I don't understand what the A with approx sign and the boxed x mean
it think it's written 20/(X-6)^2 so it's 20 divided by X-6 squared
I'm not sure why it wrote it the other way
I got X =-6
ok. so take the square root of both sides, now you have plus or minus the square root of 20= x-6
oops. ignore that.
so you not have an equal sign anywhere in the original equation?
Commplementary angles
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what is a good calculator for all algebra; would a Casio fx 260 work with all algebra equations? please name the cheapest, thanks.
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a perfect square v²+2v+_
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algebra 2 Inequalities:If equation 2 = 0 it is an open set?
Kim Reply
or infinite solutions?
The answer is neither. The function, 2 = 0 cannot exist. Hence, the function is undefined.
Embra Reply
if |A| not equal to 0 and order of A is n prove that adj (adj A = |A|
Nancy Reply
rolling four fair dice and getting an even number an all four dice
ramon Reply
Kristine 2*2*2=8
Bridget Reply
Differences Between Laspeyres and Paasche Indices
Emedobi Reply
No. 7x -4y is simplified from 4x + (3y + 3x) -7y
Mary Reply
is it 3×y ?
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J, combine like terms 7x-4y
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how do you translate this in Algebraic Expressions
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Need to simplify the expresin. 3/7 (x+y)-1/7 (x-1)=
Crystal Reply
. After 3 months on a diet, Lisa had lost 12% of her original weight. She lost 21 pounds. What was Lisa's original weight?
Chris Reply
what's the easiest and fastest way to the synthesize AgNP?
Damian Reply
types of nano material
abeetha Reply
I start with an easy one. carbon nanotubes woven into a long filament like a string
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what is system testing?
preparation of nanomaterial
Victor Reply
Yes, Nanotechnology has a very fast field of applications and their is always something new to do with it...
Himanshu Reply
good afternoon madam
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what is the application of nanotechnology?
In this morden time nanotechnology used in many field . 1-Electronics-manufacturad IC ,RAM,MRAM,solar panel etc 2-Helth and Medical-Nanomedicine,Drug Dilivery for cancer treatment etc 3- Atomobile -MEMS, Coating on car etc. and may other field for details you can check at Google
anybody can imagine what will be happen after 100 years from now in nano tech world
after 100 year this will be not nanotechnology maybe this technology name will be change . maybe aftet 100 year . we work on electron lable practically about its properties and behaviour by the different instruments
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how hard could it be to apply nanotechnology against viral infections such HIV or Ebola?
silver nanoparticles could handle the job?
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can nanotechnology change the direction of the face of the world
Prasenjit Reply
At high concentrations (>0.01 M), the relation between absorptivity coefficient and absorbance is no longer linear. This is due to the electrostatic interactions between the quantum dots in close proximity. If the concentration of the solution is high, another effect that is seen is the scattering of light from the large number of quantum dots. This assumption only works at low concentrations of the analyte. Presence of stray light.
Ali Reply
the Beer law works very well for dilute solutions but fails for very high concentrations. why?
bamidele Reply
how did you get the value of 2000N.What calculations are needed to arrive at it
Smarajit Reply
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Source:  OpenStax, Chemistry of electronic materials. OpenStax CNX. Aug 09, 2011 Download for free at http://cnx.org/content/col10719/1.9
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